Reno’s mission is to lead the semiconductor industry in the development of advanced match and flow subsystem technologies to optimize process control for volume production
Instantaneous Match™ and Instantaneous Power™ technologies enable ≤14nm semiconductor manufacturing
FlowNode™ and FastGas technologies address key barriers to next generation high volume production
Latest News
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Reno Raises $11.2 Million to Support Rapid Increase in Product Deployments
Series C investments from Samsung Venture Investment Corp. and leading IDMs and ...
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Executive viewpoints: 2018 outlook
In some ways, little changed in the industry focus in 2017, nor will it in 2018....
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Silicon Semiconductor: Reno Sets Pace In Plasma Process Control
Technical Editor Mark Andrews recently spoke with Reno’s top executives, follo...
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Electronics Weekly: Samsung, Intel and Hynix Invest in Firm for Nanoscale Chip Processes
Read Electronics Weekly’s article about Reno Sub-Systems’ Series C f...