Subsystems for Leading-Edge Plasma Processing
Plasma processing is a critical technology in the fabrication of advanced microelectronic circuits. In order to create advanced devices (sub-14nm), highly repeatable, precisely controlled, short cycle-time plasma etching and deposition are essential. Variation on these leading-edge processes are measured on the atomic scale. Plasma processing environments require single-atom-layer removal and deposition. While vacuum control and measurement have kept pace with industry needs, gas flow control and RF matching network technologies have not.