GenMatch™ Series

The GenMatch™ Series integrates Reno’s proven solid-state Electronic Variable Capacitor (EVC™) RF matching network and Precis™ generator technologies into a single, compact unit. GenMatch™ systems are ideal for leading-edge etch and deposition applications in semiconductor manufacturing, where level-to-level pulsing and short RF on-times are critical to meet performance requirements at the most advanced nodes.

GenMatch™ systems have a reduced footprint, saving space on the process tool, and are faster, more repeatable and more reliable. GenMatch™ also has lower cost of ownership and higher performance than separate units. GenMatch™ supports level-to-level pulsing, and the RF matching network matches impedance on each pulse, meaning every wafer sees the same frequency, unlike frequency sweep. AI and machine learning using the matching network’s extensive sensor and sampling capability further enhance system performance.

Power Levels: 500W to 10kW

Frequencies: 400kHz to 60MHz

Benefits include:

  • Detection of fast transients at the output of the RF matching network. These transients may represent micro-arcing in the plasma chamber that the etch or deposition tool would never identify. Reno’s RF generator can then control the power to the chamber to eliminate the micro-arcing.
  • The option to fully tune the plasma impedance, compared to standard frequency tuning approaches that can only tune limited plasma impedances, and then only the reactive part of the plasma impedance.
  • The ability to provide additional tuning options, such as sequential tuning, where the frequency tuning and EVCTMtuning are done sequentially for faster, repeatable and more stable tuning of the plasma impedance.
  • The generator can be set to sweep the frequency to tune the reactive portion of the plasma impedance, for which the EVCTM-based matching network adjusts the capacitance values to tune the resistive portion of the plasma impedance.
  • Proprietary, dual-stage heterodyne circuitry that enables a faster slew rate response from the detector stages of the control circuit. This provides a considerably more accurate measurement of pulsed RF signals.
  • Combined unit saves space on the process tool.
  • Single location required to facilitize power, water, etc.
  • All-digital units allow for multiple communication protocols, Ethernet, EtherCAT and DeviceNet.

GenMatch™ Models

  • 1213GM – 1.25kW, 13MHz 
  • 3013GM – 3kW, 13Mhz

Additional powers and frequencies are in the pipeline.