Reno’s patented Precis™ solid-state RF power generators are designed specifically for use in the most advanced plasma etch and deposition applications in semiconductor manufacturing to deliver accurate and stable power delivery, fast pulsing for shorter process steps and a compact design for space savings. Available in multiple powers and frequencies, Precis™ generators ensure that forward and reflected power levels can be easily measured and adjusted with closed-loop, precision control over frequency, output power, phase and RF signal modulation with high reliability.
Precis™ generators are water cooled and operate from a three-phase, 200/208VAC, 50/60Hz AC source. The units are connected to a suitable RF Matching Network that is designed to operate into loads with rapidly changing impedance conditions created by the plasma. When Reno’s PrecisTM RF generators are combined with the company’s EVCTM matching networks, they provide enhanced processing capabilities and unrivaled plasma stability, with accurate and repeatable matching times of 0.5ms or less. This eliminates RF variability, reduces reflected power, widens the process window, increases plasma stability and delivers the exact plasma condition for every wafer, every time.